JPS6217122U - - Google Patents
Info
- Publication number
- JPS6217122U JPS6217122U JP1985107856U JP10785685U JPS6217122U JP S6217122 U JPS6217122 U JP S6217122U JP 1985107856 U JP1985107856 U JP 1985107856U JP 10785685 U JP10785685 U JP 10785685U JP S6217122 U JPS6217122 U JP S6217122U
- Authority
- JP
- Japan
- Prior art keywords
- tank
- holes
- processing
- utility
- model registration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims 5
- 239000004065 semiconductor Substances 0.000 claims 5
- 238000004140 cleaning Methods 0.000 claims 1
- 238000011161 development Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
- B05C3/02—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material
- B05C3/09—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material for treating separate articles
- B05C3/109—Passing liquids or other fluent materials into or through chambers containing stationary articles
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985107856U JPH0642333Y2 (ja) | 1985-07-15 | 1985-07-15 | 半導体材料の処理槽 |
DE19863623233 DE3623233A1 (de) | 1985-07-15 | 1986-07-10 | Becken zur behandlung von halbleitermaterialien |
KR1019860005591A KR870001648A (ko) | 1985-07-15 | 1986-07-11 | 반도체 재료의 처리조(處理槽) |
KR2019900012096U KR910001932Y1 (ko) | 1985-07-15 | 1990-08-10 | 반도체 재료의 처리조 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985107856U JPH0642333Y2 (ja) | 1985-07-15 | 1985-07-15 | 半導体材料の処理槽 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6217122U true JPS6217122U (en]) | 1987-02-02 |
JPH0642333Y2 JPH0642333Y2 (ja) | 1994-11-02 |
Family
ID=14469797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985107856U Expired - Lifetime JPH0642333Y2 (ja) | 1985-07-15 | 1985-07-15 | 半導体材料の処理槽 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPH0642333Y2 (en]) |
KR (2) | KR870001648A (en]) |
DE (1) | DE3623233A1 (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050196519A1 (en) * | 2004-03-08 | 2005-09-08 | Depuy Products, Inc. | Apparatus for producing a biomimetic coating on a medical implant |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5452985A (en) * | 1977-10-04 | 1979-04-25 | Kyushu Nippon Electric | Etching device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1067657B (de) * | 1955-08-03 | 1959-10-22 | Schilde Maschb Ag | Tauchbehaelter fuer Oberflaechenbehandlung |
DE1577685B2 (de) * | 1965-08-13 | 1974-07-04 | Duerr, Otto, 7000 Stuttgart | Tauchbecken zur Oberflächenbehandlung von Werkstücken, insbesondere zum Lackieren |
-
1985
- 1985-07-15 JP JP1985107856U patent/JPH0642333Y2/ja not_active Expired - Lifetime
-
1986
- 1986-07-10 DE DE19863623233 patent/DE3623233A1/de not_active Ceased
- 1986-07-11 KR KR1019860005591A patent/KR870001648A/ko not_active Withdrawn
-
1990
- 1990-08-10 KR KR2019900012096U patent/KR910001932Y1/ko not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5452985A (en) * | 1977-10-04 | 1979-04-25 | Kyushu Nippon Electric | Etching device |
Also Published As
Publication number | Publication date |
---|---|
KR870001648A (ko) | 1987-03-17 |
JPH0642333Y2 (ja) | 1994-11-02 |
KR910001932Y1 (ko) | 1991-03-30 |
DE3623233A1 (de) | 1987-01-15 |